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b. 448

composition: Op. 11, Concerto in E minor, Mvt I

No fingering in FE (→GE)

Fontana's fingering in EE

..

The digits added by Fontana specify hand position changes resulting from the fingering indicated in print by Chopin.

category imprint: Differences between sources

issues: EE revisions

b. 448

composition: Op. 16, Rondo in E♭ major

Wedges in FE (→EE)

Staccato dot in L.H. in GE

..

Both the change of a wedge for a dot over the L.H. quaver, and the lack of mark in the R.H. are most probably the result of negligence of the engraver of GE

category imprint: Differences between sources

issues: Inaccuracies in GE , Errors in GE

b. 448-449

composition: Op. 16, Rondo in E♭ major

signs in FE (→GE)

from c1 in EE

from b suggested by the editors

..

!!!    ZMIENIĆ   !!!

In FE (→GE), the engraver placed two separate  hairpin marks – the former in bar 448 and the latter in bar 449. It must be an inaccuracy of the engraver (cf. the marks in bars 450-451 and 452-453), most probably caused by the fact that in FE bar 449 a new line (missing endings of such elements of notation as slurs, dynamic hairpins, particularly when transitioning to a new line or page, are a frequent mistake of the editions). In EE, the reviser justly placed one mark. We suggest beginning the hairpin right after the  mark.

category imprint: Differences between sources; Editorial revisions

issues: EE revisions , Inaccuracies in GE , Inaccuracies in FE

b. 448

composition: Op. 16, Rondo in E♭ major

in FE (→EE)

No indication in GE

..

The lack of ​​ is probably an oversight by the engraver of GE.

category imprint: Differences between sources

issues: Errors in GE

b. 448-449

composition: Op. 11, Concerto in E minor, Mvt III

No slur in FE (→GE1GE2)

Slur in EE & GE3

..

The absence of the slur in the L.H. is one of a few defects of this type in FE; in this case, it probably stems from the gap caused by the change of clef. The slur was added in EE and GE3.

category imprint: Differences between sources; Editorial revisions

issues: EE revisions , GE revisions