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b. 414-415

composition: Op. 11, Concerto in E minor, Mvt I

No fingering in FE (→GE)

Fontana's fingering in EE

Fingering written into FEH

..

The fingering of EE differs from the one written in FEH only in the repetition of indications, i.e. in a simplified, "reminding" form, in subsequent analogous figures.

category imprint: Differences between sources

issues: Annotations in teaching copies , EE revisions , Annotations in FEH

b. 414

composition: Op. 11, Concerto in E minor, Mvt I

..

The inaccurately reproduced staccato mark in GE1 (→GE2), dot instead of wedge, was restored in GE3, probably after the base text or an analogy.

category imprint: Differences between sources

issues: Inaccuracies in GE , GE revisions

b. 414

composition: Op. 11, Concerto in E minor, Mvt I

..

In FE, the 1st quaver in the R.H. is written an octave lower, which resulted from the erroneously ended octave sign (it ends too early) used to write the entire phrase in bars 413-414. This patent mistake was corrected both in GE and EE

category imprint: Differences between sources

issues: EE revisions , Errors in FE , GE revisions

b. 414

composition: Op. 16, Rondo in E♭ major

..

In FE (→EE1), there is no accidental before the 4th semiquaver, which results in d3 both on the 4th and the 6th semiquavers. Due to the C major key (A​​​​​​​ minor) valid from the middle of bar 412, it must be considered a mistake, probably repeated after [A]. The necessary  lowering d3 to d3 was added in GE and EE2 (→EE3).

category imprint: Interpretations within context; Differences between sources

issues: EE revisions , Errors in FE , GE revisions , Omission of current key accidentals , Last key signature sign , Errors repeated in EE

b. 414-415

composition: Op. 16, Rondo in E♭ major

Hairpin in FE

Hairpin in EE

No mark in GE & EE

..

The ​​​​​​​ hairpin for the L.H. was completely overlooked by the engraver of GE. In turn, the reviser of EE started it already at the beginning of the bar.

category imprint: Differences between sources

issues: EE revisions , Errors in GE