Issues : Errors in EE

b. 4-6

composition: Op. 10 No 8, Etude in F major

Fingering in A

FE (→GE)

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In the main text we give the fingering of the L.H., written by Chopin in A. In FE (→GE) the '3' digit was overlooked in bar 5, which is almost certainly an oversight. In EE Fontana completed the fingering at the beginning of bar 5, adding digits for each note. EE3 erroneously features '2' as the 1st digit in bar 4 (it may be a mistake related to the transcription of the "continental" fingering system to the "British" one – cf. General Editorial Principlesp. 10).

category imprint: Differences between sources

issues: EE revisions , Inaccuracies in FE , Errors in EE

b. 4

composition: Op. 25 No 3, Etude in F major

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EE1 omitted the bass clef at the end of the bar. This patent error, frequent in Chopin sources, was already corrected in EE2 (→EE3).

category imprint: Differences between sources

issues: EE revisions , Errors in EE

b. 4

composition: Op. 25 No 6, Etude in G♯ minor

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FE, EE1 and GE1 misinterpreted the abbreviated notation of FC and of the remaining Stichvorlage manuscripts, giving the 2nd, 3rd and 4th groups of semiquavers without any accidentals. The mistake was corrected in EE2 (→EE3) and GE2 (→GE3). Similarly in almost all analogous places – cf. bars 8, 20 and 36, as well as 12 and 40.

category imprint: Interpretations within context; Differences between sources

issues: EE revisions , Errors in FE , Errors in EE , Omissions to cancel alteration , Errors in GE , GE revisions , Inaccuracies in FC

b. 4

composition: Op. 28 No. 15, Prelude in D♭ major

..

In EE the minim c1 is mistakenly dotted.

category imprint: Interpretations within context; Differences between sources

issues: Errors in EE

b. 5

composition: Op. 10 No 1, Etude in C major

b3 in CLI & EE

a3 in FE (→GE)

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The b3 note on the last semiquaver of CLI and EE could be easily considered as a mistake except for the fact that in analogous bar 53 the sources have the same text. Therefore, it cannot be excluded that in CLI we are dealing with the original version, while in EE with the editor's revision.

category imprint: Differences between sources

issues: EE revisions , Errors in EE , Main-line changes , Errors of CLI